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Advanced Research Center for Nanolithography ARCNL
PostDoc: Repetition-rate limits of X band accelerator technology
Advanced Research Center for Nanolithography ARCNL
The Advanced Research Center for Nanolithography is a new type of public-private partnership between the University of Amsterdam, the VU University Amsterdam, the Netherlands Organisation for Scientific Research (NWO), and ASML.
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JOB DETAILS
Published: 1 month ago
Application deadline: Nov 12
Location: Amsterdam, Netherlands
Please mention that you found this job on Academic Positions when applying.
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PostDoc: Repetition-rate limits of X band accelerator technology

The goal of this PostDoc project is to push forward the boundaries of novel X-band-based accelerators for driving future light sources (FELs) with specific emphasis to generating highest repetition rates.
Accelerator structures driven in the X-band (12 GHz) hold the potential of setting new standards for accelerator based compact sources of high energy photons from the EUV to beyond hard X rays. Many user demands on such sources require high repetition rates higher than present maximal operational rates of ~200 Hz. Can repetition rates of warm X-band accelerators be pushed to 1 kHz or even further? That is the central question of the project.
Beam dynamics simulations will form the initial basis of assessing repetition rate limits. Two types of experimental tests are foreseen to benchmark the simulations: 1 - Measurements of the electron bunch quality of high-rep-rate electron sources which will be performed at the TU/e (Eindhoven). 2 – Determinations of limits on accelerator structures and high-rep-rate RF power schemes which can be established at the test stands at CERN.

About the group

The project is embedded in the collaboration CompactLight (www.compactlight.eu), which receives funding from the European’s Horizon2020 research and innovation programme. The PostDoc project is a joint project of the Dutch partners of CompactLight, the Univerity of Technology Eindhoven (TU/e) and Vrije Universiteit Amsterdam (VU). Within the project the latter is represented by the Advanced Research Center for Nanolithography (ARCNL), which is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML.

Qualifications

Ph.D. degree and with further research experience in a relevant field of research.
You are especially encouraged to apply if you have a strong physics background in one or both of the following fields:
• Particle beams
• Accelerator technology

Terms of employment

You will be appointed as postdoc for the duration of 1 year with the option of a one-year extension. The position is combined with an academic association with the Vrije Universiteit (VU) in Amsterdam and University of Technology Eindhoven (TU/e) in Eindhoven.
Foreign employees are assisted with housing and visa applications and compensated towards their transport costs.

Contact info

Prof.dr. ir. Ronnie Hoekstra
e-mail: hoekstra@arcnl.nl
Phone: +31 (0)50-3633687 

prof. dr. ir. O.J. Luiten
e-mail: o.j.luiten@tue.nl
phone: +31 (0)40-2474359

Your application includes your resume and a motivation letter (max. 1 page). Applications without this motivation will not be taken into account. However, with this motivation your application will receive our full attention.

Please ignore the apply button below.

Applications should be sent by e-mail to hoekstra@arcnl.nl and o.j.luiten@tue.nl.

Online screening may be part of the selection.

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